Bartłomiej Stonio, MSc. Eng.

Research Assistant


Graduated from the Faculty of Electronics and Information Technology of the Warsaw University of Technology (MSc. Eng. 2014). Starting from 2014, a PhD student at the same Faculty, the Institute of Microelectronics and Optoelectronics WUT. Since 2014, he has been an employee of CEZAMAT. His research interests include high temperature processes, layer deposition and structures based on 2D materials.

Areas of research

  • wet and dry oxidation and annealing processes
  • LPCVD processes
  • nanoelectronic devices

Selected Publications

  1. B. Stonio, N. Kwietniewski, P. Firek, M. Sochacki, “Reactive ion etching of 4H-SiC with BCl 3 plasma”, Przegląd Elektrotechniczny, ISSN 0033-2097
  2. D. Nowak, M. Clapa, P. Kula, M.Sochacki, B. Stonio, M. Galazka,M. Pelka,D. Kuten,P. Niedzielski, “Influence of the Interactions at the Graphene–Substrate Boundary on Graphene Sensitivity to UV Irradiation” Materials, 2019, vol. 12, nr 23, s.1-9, Numer artykułu:3949. DOI:10.3390/ma122333949
  3. P. Firek, B.Stonio, “ Influence of AlN etching process on MISFET structures”Microelectronics International, 2019, vol. 36, nr 3, s.109-113. DOI:10.1108/MI-12-2018-0081
  4. P. Sai, D.B. But, I. Yahniuk, M. Grabowski, M. Sakowicz, P. Kruszewski, P. Prystawko, A. Khachapuridze, K. Nowakowski-Szkudlarek, J. Przybytek, P. Wiśniewski, B. Stonio, M. Słowikowski, S.L. Rumyantsev, W. Knap, G. Cywiński, “AlGaN/GaN field effect transistor with two lateral Schottky barrier gates towards resonant detection in sub-mm range”, Semiconductor Science and Technology, 2019, vol. 34, nr 2, s.1-6, Numer artykułu:024002. DOI:10.1088/1361-6641/aaf4a7
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